Cleaner Technologies for Semiconductor Cleaning Processes 


Vol. 5,  No. 1, pp. 62-77, Jun.  1999


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  Abstract

Semiconductor industry has rapidly grown because of the need from electronic and computer industries. However the global environmental regulations for various hazardous chemical compounds, which are indispensably used in semiconductor manufacturing process, are getting stronger. The semiconductor industries should develop the cleaner technologies in order to both lead the future world market and avoid the regulations form environmentally developed countries. In this paper, cleaner technologies for semiconductor cleaning processes are surveyed, such as gas phase process, UV process, and plasma process. Advantages and disadvantages of these processes are discussed.

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  Cite this article

[IEEE Style]

C. YS and Y. J, "Cleaner Technologies for Semiconductor Cleaning Processes," Clean Technology, vol. 5, no. 1, pp. 62-77, 1999. DOI: .

[ACM Style]

Cho YS and Yi J. 1999. Cleaner Technologies for Semiconductor Cleaning Processes. Clean Technology, 5, 1, (1999), 62-77. DOI: .

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한국연구재단 등재학술지