Digital Library[ Search Result ]

Search : "[ keyword: Negative photoresist ]" (1)
Study of Supercritical Carbon Dioxide/n-Butyl Acetate Co-solvent System with High Selectivity in Photoresist Removal Process
Kim DW  Heo H  Lim KT
Vol. 23, No. 4, pp. 357-363, Dec. 2017
10.7464/ksct.2017.23.4.357

Search
(IN TITLE, AUTHOR, ABSTRACT,KEYWORDS)

Advanced Search ▼

POPULAR KEYWORDS
(TOP 10 KEYWORDS)

Recent Publications
(LAST 3 YEARS)

pISSN : 1598 - 9712
eISSN : 2288 - 0690

한국연구재단 등재학술지