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Analysis of the Effect of the Etching Process and Ion Injection Process in the Unit Process for the Development of High Voltage Power Semiconductor Devices

Gyu Cheol Choi KyungBeom Kim Bonghwan Kim Jong Min Kim SangMok Chang

Vol. 29, No. 4, pp. 255-261, Dec. 2023

10.7464/ksct.2023.29.4.255

High voltage power semiconductor

Process optimization

Etching process

Ion implantation process