Development of Cleaning Agents for Solar Silicon Wafer 


Vol. 18,  No. 1, pp. 43-50, Mar.  2012


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  Abstract

Cleaning procedure of solar silicon wafer, following ingot sawing process in solar cell production is studied. Types of solar silicon wafer can be divided into monocrystalline or multicrystalline, and slurry sawn wafer or diamond sawn wafer according to the ingot growing methods and the sawing methods, respectively. Wafer surface and contaminants can vary with these methods. The characterisitics of contaminants and wafer surface are investigated for each cleaning substrate, and appropriate cleaning agents are developed. Physical properties and cleaning ability of the cleaning agents are evaluated in order to verify the application in the industry. The wafers cleaned with the cleaning agents do not show any residual contaminants when analyzed by XPS and regular patterns are formed after texturization. Furthermore, the cleaning agents are applied in the production industry, which shows superior cleaning results compared to the existing cleaning agents.

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  Cite this article

[IEEE Style]

B. SJ, L. HY, L. JG, B. JH, L. DG, "Development of Cleaning Agents for Solar Silicon Wafer," Clean Technology, vol. 18, no. 1, pp. 43-50, 2012. DOI: .

[ACM Style]

Bae SJ, Lee HY, Lee JG, Bae JH, and Lee DG. 2012. Development of Cleaning Agents for Solar Silicon Wafer. Clean Technology, 18, 1, (2012), 43-50. DOI: .

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