Separation of Nitric Acid and Acetic Acid from the Waste Acid in LCD Etching Process 


Vol. 14,  No. 2, pp. 123-128, Jun.  2008


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  Abstract

The waste solution, which was discharged from the recovery process of LCD etching solution, consists of 15 wt% nitric acid and 20 wt% acetic acid. In this study, it was conducted to separate acid individually from the mixed acid by vacuum evaporation under -760 mmHg gauge and at 40℃. We have investigated evaporation behavior of acid as a function of temperature. There have been problems that tiny amount of nitric acid were evaporated simultaneously above 33℃. Thus, efforts were conducted to recover acetic acid by vacuum evaporation with adding H2O, waste mixed acid and 20 g/L NaOH for a curb on evaporation of nitric acid. By adding H2O, evaporation of nitric acid was reduced from 7% to 0.78%. However, it was reduced from 7% to 0.25% by adding mixed acid. In view of the results achieved so far, we may expect to separate the etching solution individually by controlling vacuum conditions.

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  Cite this article

[IEEE Style]

C. HD, R. YM, P. SK, K. JH, S. CH, K. JY, A. JW, "Separation of Nitric Acid and Acetic Acid from the Waste Acid in LCD Etching Process," Clean Technology, vol. 14, no. 2, pp. 123-128, 2008. DOI: .

[ACM Style]

Chun HD, Roh YM, Park SK, Kim JH, Shin CH, Kim JY, and Ahn JW. 2008. Separation of Nitric Acid and Acetic Acid from the Waste Acid in LCD Etching Process. Clean Technology, 14, 2, (2008), 123-128. DOI: .

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pISSN : 1598 - 9712
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한국연구재단 등재학술지