Reclamation of High Purity Organic Solvents from Waste Photoresist Stripper 


Vol. 13,  No. 4, pp. 257-265, Dec.  2007


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  Abstract

As a basic study for the development of pilot-scale distillation process of waste photoresist strippers from semiconductor industry, lab-scale experiments for the recovery of NMP (N-methyl-pyrrolidione) and BDG (Butyldiglycol) from waste photoresist strippers have been made using a spinning band vacuum distillation column. Purities of NMP and BDG obtained from the present experiments were higher than 99.5%. Furthermore, water content was less than 1000 ppm, color grade(APHA) less than 50, most metal contents except sodium less than 1 ppb. Those results indicate that NMP and BDG reclamed by distillation satisfy the their specifications required for the formulation of new photoresist strippers. Recovery rate of NMP and BDG was 96 and 53%, respectively, for type A, and 93 and 57%, respectively, for type B waste PR stripper solution..

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  Cite this article

[IEEE Style]

K. DJ, O. HS, K. JK, P. MJ, L. M, K. KK, "Reclamation of High Purity Organic Solvents from Waste Photoresist Stripper," Clean Technology, vol. 13, no. 4, pp. 257-265, 2007. DOI: .

[ACM Style]

Kim DJ, Oh HS, Kim JK, Park MJ, Lee M, and Koo KK. 2007. Reclamation of High Purity Organic Solvents from Waste Photoresist Stripper. Clean Technology, 13, 4, (2007), 257-265. DOI: .

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pISSN : 1598 - 9712
eISSN : 2288 - 0690

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